WET PROCESS PROCESSING METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To decrease patterning defects by preventing the drying and crystallizing of a processing liquid when separating and removing the processing liquid sticking to a substrate by an air knife and preventing the increase of the concentration of the cyclically used processing liquid by the waste gas of a processing chamber. SOLUTION: The substrate 3 is subjected to processing by spraying the processing liquid from processing liquid nozzles 5 and thereafter the air or gas, such as inert gas, containing the solvent mist of the processing liquid is ejected toward the substrate 3 from air knives 6, by which the processing liquid on the substrate 3 is removed and the drying and crystallizing of the processing liquid are prevented.