发明名称 MANUFACTURING SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing system for inhibiting the manufacture of non-conforming articles in advance. SOLUTION: In this manufacturing system, a plasma emission spectrum for directly reflecting a reaction state in a treatment device 17 is measured by a spectrum part 18. Based on an optical spectrum when conforming articles are to be manufactured, the range of an evaluation value is set. In actual manufacture, the emission spectrum is similarly measured, and it is judged whether the evaluation value that is calculated by measuring the emission spectrum exists within the range or not. When the evaluation value deviates from the range, the device is stopped, thus saving materials that are thrown into the treatment device 17 and time.
申请公布号 JP2001257245(A) 申请公布日期 2001.09.21
申请号 JP20000067429 申请日期 2000.03.10
申请人 HAMAMATSU PHOTONICS KK 发明人 YOSHIDA HARUMASA
分类号 H01L21/66;H01L21/205;H01L21/302;H01L21/3065;(IPC1-7):H01L21/66;H01L21/306 主分类号 H01L21/66
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