发明名称 ION GENERATION PLASMA SOURCE
摘要 PURPOSE: An ion generation plasma source is provided to prevent the corrosion due to residues by separating a gas distribution body into a spacer and a gas supply distribution ring. CONSTITUTION: A matching box(220) is installed in an ion generation plasma source(100). A bus-bar(210) and a ferrite(200) are formed in the matching box(220). The matching box(220) generates an internal voltage of the ion generation plasma source(100). A ferrite housing(190), an insulator(170), a gas supply distribution ring(140), and a gas distribution body(110) are installed in the ion generation plasma source(100). A multitude of auxiliary ring(120,130,140,150,160,180) is installed between the gas distribution body(110) and the gas supply distribution ring(140), the gas supply ring(140) and the insulator(170), and the insulator and the ferrite housing(190). The gas distribution body(110) has a spacer including a gas supply path and a valve for supplying the gas.
申请公布号 KR20010087686(A) 申请公布日期 2001.09.21
申请号 KR20000011569 申请日期 2000.03.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, MAN HO
分类号 H01L21/306;(IPC1-7):H01L21/306 主分类号 H01L21/306
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