发明名称 |
INFRARED RAY DETECTION ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide the infrared ray detection element of high sensitivity by a simple manufacture process by using perovskite-type Mn oxide thin film whose resistance temperature coefficient is higher than a conventional case. SOLUTION: A wiring layer laminated on a part of a SiO2 layer which is laminated on a Si substrate via a gap part is provided with, an electrode layer constituted of plural layers which are laminated by straddling a part of the wiring layer and a part of the SiO2 layer and which have at least iridium layers and a bolometer thin film, which is laminated by straddling a part of the electrode layer and a part of the SiO2 layer and is mainly constituted of provskite- type manganese oxide.
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申请公布号 |
JP2001257384(A) |
申请公布日期 |
2001.09.21 |
申请号 |
JP20000064535 |
申请日期 |
2000.03.09 |
申请人 |
MITSUBISHI ELECTRIC CORP |
发明人 |
HIGUMA HIROKO;MIYASHITA SHOJI;UCHIUMI YOSHIKAZU;HATA HISATOSHI |
分类号 |
G01J1/02;G01J5/02;G01J5/20;H01L35/22;(IPC1-7):H01L35/22 |
主分类号 |
G01J1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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