发明名称 INFRARED RAY DETECTION ELEMENT
摘要 PROBLEM TO BE SOLVED: To provide the infrared ray detection element of high sensitivity by a simple manufacture process by using perovskite-type Mn oxide thin film whose resistance temperature coefficient is higher than a conventional case. SOLUTION: A wiring layer laminated on a part of a SiO2 layer which is laminated on a Si substrate via a gap part is provided with, an electrode layer constituted of plural layers which are laminated by straddling a part of the wiring layer and a part of the SiO2 layer and which have at least iridium layers and a bolometer thin film, which is laminated by straddling a part of the electrode layer and a part of the SiO2 layer and is mainly constituted of provskite- type manganese oxide.
申请公布号 JP2001257384(A) 申请公布日期 2001.09.21
申请号 JP20000064535 申请日期 2000.03.09
申请人 MITSUBISHI ELECTRIC CORP 发明人 HIGUMA HIROKO;MIYASHITA SHOJI;UCHIUMI YOSHIKAZU;HATA HISATOSHI
分类号 G01J1/02;G01J5/02;G01J5/20;H01L35/22;(IPC1-7):H01L35/22 主分类号 G01J1/02
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