METHOD AND DEVICE FOR ANALYZING FOREIGN MATTER, AND METHOD FOR ANALYZING

摘要

PROBLEM TO BE SOLVED: To provide a device and a method for analyzing foreign matters capable of specifying a process where foreign matters actually generate, accumu lated on a product manufactured through a plurality of processes such electric circuit devices as a display device like a TFT, CCD, electric circuit substrate, and semiconductor device. SOLUTION: A sample is mounted in a vacuum chamber. A stage is driven on a basis of a foreign matter coordinate determined in a foreign matter inspecting process in advance to observe the foreign matter by a charged beam. The foreign matter is peeled by using a probe equipped in the vacuum chamber and a substance on a peeled part of the sample is specified to determine the actual foreign matter generating process.