| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a reflection type active matrix substrate, having the satisfactory diffuse reflection characteristic and its manufacturing method, without complicating the manufacturing process of the active matrix substrate. SOLUTION: In the manufacturing method of the active matrix substrate, an active element and address wiring having at least one first insulating film are provided on an insulating substrate, a second insulating film is provided, so as to cover the active element and the address wiring, and a pixel electrode connected with the active element through the first opening part is disposed in a matrix form on the second insulating film. The etching rate of the second insulating film is set higher than the etching rate of the first insulating film for conductive etching, a mortar-like recessed and projecting part is provided and a third insulating film is provided, which covers the substrate surface having the recessed and projecting part and has a second opening part for connecting the pixel electrode with the active element.</p> |
