发明名称 ALIGNER, EXPOSING METHOD AND METHOD OF MANUFATCURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide an aligner, an exposing method, and a method of manufacturing a semiconductor device by which a man power or a mistake associated with the changing work of parameter can be reduced. SOLUTION: A parameter of a main storage part 20 is stored in a sub storage part 23 at a predetermined point, the parameter of the main storage part 20 is compared with that of the sub storage part 23 by a parameter control system 24, and the comparison result is outputted.
申请公布号 JP2001257142(A) 申请公布日期 2001.09.21
申请号 JP20000064010 申请日期 2000.03.08
申请人 NIKON CORP 发明人 MAEDA KOJI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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