发明名称 PROCESS CONTROL DEVICE AND PROCESS CONTROL METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide a process control device and a process control method which can keep a high productivity and improve characteristics in a processing step in which a processing part provided with a plurality of process devices performs a processing operation two times or more. SOLUTION: This process control device is provided with a device group information storage means in which both a first processing step and a following second processing step perform a processing step to be processed in the same working process and an information concerning the gorup division of a plurality of processing devices, and a device group selection means which selects the device group so that the processing device in the device group of the processing device for the first processing step may perform a processing operation in the second processing step.</p>
申请公布号 JP2001257141(A) 申请公布日期 2001.09.21
申请号 JP20000066477 申请日期 2000.03.10
申请人 MITSUBISHI ELECTRIC CORP;RYODEN SEMICONDUCTOR SYST ENG CORP 发明人 YANARU TAICHI;OKABE MASATAKA;OTSUKA HIROFUMI
分类号 H01L21/02;G05B15/02;G05B19/418;(IPC1-7):H01L21/02 主分类号 H01L21/02
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