发明名称 |
PROCESS CONTROL DEVICE AND PROCESS CONTROL METHOD |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a process control device and a process control method which can keep a high productivity and improve characteristics in a processing step in which a processing part provided with a plurality of process devices performs a processing operation two times or more. SOLUTION: This process control device is provided with a device group information storage means in which both a first processing step and a following second processing step perform a processing step to be processed in the same working process and an information concerning the gorup division of a plurality of processing devices, and a device group selection means which selects the device group so that the processing device in the device group of the processing device for the first processing step may perform a processing operation in the second processing step.</p> |
申请公布号 |
JP2001257141(A) |
申请公布日期 |
2001.09.21 |
申请号 |
JP20000066477 |
申请日期 |
2000.03.10 |
申请人 |
MITSUBISHI ELECTRIC CORP;RYODEN SEMICONDUCTOR SYST ENG CORP |
发明人 |
YANARU TAICHI;OKABE MASATAKA;OTSUKA HIROFUMI |
分类号 |
H01L21/02;G05B15/02;G05B19/418;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|