摘要 |
PROBLEM TO BE SOLVED: To provide a cation or acid generating agent suitable for use in a chemical amplification type resist material, having high sensitivity to energy beams and capable of generating a cation or acid. SOLUTION: The cation or acid generating agent comprises an energy beam sensitive fluoroalkylonium salt of formula (1) in which groups R1-R3 (alkyl, aryl or the like) and a group Rf (fluoroalkyl) combine with the central element A (I, S, Se, Te, N or P). The chemical amplification type resist material is obtained by blending the acid generating agent. |