| 摘要 |
PROBLEM TO BE SOLVED: To realize a novel generation method which is capable of easily generating a special surface shape of a three-dimensional structure which changes smoothly and continuously in a height direction on a photosensitive material layer or a substrate. SOLUTION: The generation method for the special surface shape changes the thickness of the photosensitive material layer 11 according to the desired special surface shape by applying a photosensitive material to a prescribed thickness on the surface of a substrate material 10 to be formed with the special surface shape of the desired three-dimensional structure to form the photosensitive material layer and exposing a mask pattern LF of a prescribed light transmittance distribution on the photosensitive material layer 11 by using a mask for exposure stepwise changing in the light transmittance in correspondence to the special surface shape. When the pattern LF of the mask for exposure is exposed to the photosensitive material layer 11, the exposure pattern is slightly deviated in focus by defocusing, by which the level difference of the light transmittance distribution of the mask pattern is eliminated. |
