发明名称 |
POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition which satisfies heat resistance, adhesion and low dielectric properties and can form a good image. SOLUTION: The positive type photosensitive resin composition comprises (A) an organic solvent-soluble polyimide having an acid group, (B) a diethyl vinyl ether which imparts low dielectric properties and (C) a photo-acid generating agent. A coating of the photosensitive resin composition is irradiated with UV through a mask and the irradiated part is leached with an aqueous alkali solution to obtain a positive type heat resistant relief. |
申请公布号 |
JP2001255657(A) |
申请公布日期 |
2001.09.21 |
申请号 |
JP20000114388 |
申请日期 |
2000.03.13 |
申请人 |
TOTO KAGAKU KOGYO KK |
发明人 |
UEMITSU TATSUYOSHI;NAKANO TSUNETOMO;YAMAOKA TSUGIO |
分类号 |
G03F7/039;C08G73/10;C08K5/00;C08L79/08;G03F7/004;G03F7/029;G03F7/037;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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