发明名称 POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a positive type photosensitive resin composition which satisfies heat resistance, adhesion and low dielectric properties and can form a good image. SOLUTION: The positive type photosensitive resin composition comprises (A) an organic solvent-soluble polyimide having an acid group, (B) a diethyl vinyl ether which imparts low dielectric properties and (C) a photo-acid generating agent. A coating of the photosensitive resin composition is irradiated with UV through a mask and the irradiated part is leached with an aqueous alkali solution to obtain a positive type heat resistant relief.
申请公布号 JP2001255657(A) 申请公布日期 2001.09.21
申请号 JP20000114388 申请日期 2000.03.13
申请人 TOTO KAGAKU KOGYO KK 发明人 UEMITSU TATSUYOSHI;NAKANO TSUNETOMO;YAMAOKA TSUGIO
分类号 G03F7/039;C08G73/10;C08K5/00;C08L79/08;G03F7/004;G03F7/029;G03F7/037;H01L21/027 主分类号 G03F7/039
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