HDP-CVD SYSTEM AND GAP-FILLING METHOD USING THE SAME

摘要

PURPOSE: An HDP(High Density Plasma)-CVD(Chemical Vapor Deposition) system and a gap-filling method using the same are provided to prevent the re-deposition of an insulating layer by heating a substrate in a deposition process of the insulating layer. CONSTITUTION: A chilled water pipe is installed at a susceptor(31) in order to protect an aluminium wiring. The first heating portion(31b) is installed within the susceptor(31). The second heating portion(31c) is installed within a wafer chuck(31a). The third heating portion(71a) is installed at a belljar(71) for covering an upper chamber(11a). A remote plasma generator(81) is formed at an outside of the vacuum chamber(11) in order to generate plasma. A plasma transfer tube(91) transfers the generated plasma to the vacuum chamber(11).