| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a laser annealing device that has a simple configuration, drastically improves the pointing stability of a laser beam, at the same time, rarely causes loss of energy, and can achieve uniform polycrystallization. SOLUTION: A laser annealing device 10 is equipped with an excimer laser oscillator 110, and a homogenizer 120 that sets the size of a laser beam L that is outputted from the laser oscillator 110 to a desired long shape and at the same time makes strength distribution uniform, scans a substrate 200 where an amorphous semiconductor film is formed on a surface 200a with the long- shaped laser beam L, and changes the amorphous semiconductor film into a polycrystal. The laser annealing device 10 is also equipped with a means for dividing the laser beam L that is allowed to oscillate from the laser oscillator 110 into two parts, and an optical means 20 for inversing an incident angle where one of the laser beams that are divided into two parts enters the homogenizer 120. In this case, an image rotator is used in the optical means 20, thus easily adjusting the application position of the laser beam L, and hence achieving more uniform polycrystallization.</p> |
