ETCHING APPARATUS AND ETCHING METHOD

摘要

PROBLEM TO BE SOLVED: To perform fine processing on a transparent conductive film such as an indium tin oxide film(ITO film) by a wet method without causing to generate a residue. SOLUTION: An etching apparatus for etching a substrate is provided with a first etching treating tank having a first chemical liquid treating tank 11, a first washing treating tank 12 and a first drying treating tank 13, and a second etching treating tank having a second chemical liquid treating tank 14, a second washing treating tank 15, and a second drying treating tank 16. The second etching treating tank etches the substrate which is dried in the first drying treating tank 13 in the first etching treating tank.