发明名称 METHOD OF FORMING ALIGNMENT MARK
摘要 PROBLEM TO BE SOLVED: To make an alignment mark produceable without requiring much labor and, at the same time, surely detectable by means of a measuring apparatus. SOLUTION: A contact hole 4 and an alignment groove 5 are formed through an insulating layer 2 by etching the layer 2 until the bottoms of the hole 4 and groove 5 reach a first metallic layer 3, and a metal 6 is caused to deposit in the groove 5 and hole 4. Continuously, the surface of the metal 6 is caused to subside within the positioned extent of the groove 5 by the CMP method, so as to form a profile for the alignment mark formed on a second metallic layer 9 caused to deposit on the insulating layer 2.
申请公布号 JP2001257160(A) 申请公布日期 2001.09.21
申请号 JP20010004180 申请日期 2001.01.11
申请人 INFINEON TECHNOLOGIES AG 发明人 EBERTSEDER EVA;LEHR MATTHIAS;WERNEKE TORSTEN;HANEBECK JOCHEN;PAHLITZSCH JURGEN
分类号 G03F9/00;H01L21/027;H01L21/304;H01L21/306;H01L21/3205;H01L23/52;H01L23/544;(IPC1-7):H01L21/027;H01L21/320 主分类号 G03F9/00
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