ACTIVE MATRIX SUBSTRATE, ITS MANUFACTURING METHOD, OPTOELECTRONIC DEVICE AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To suppress coloring caused by an insulating film formed, in order to prevent impurity diffusion from a substrate regarding an active matrix substrate, its manufacturing method, an optoelectronic device and its manufacturing method. SOLUTION: In the active matrix substrate having a plurality of scanning lines, a plurality of data lines, and pixel electrodes and switching elements disposed in matrix form corresponding to the crossing of the scanning lines and the data lines, the pixel electrodes and the switching elements are provided via a substrate insulating film 42 on the substrate 41, and the substrate insulating film is provided with a first insulating film 42b, having the fixed refractive index different from the substrate on the substrate. Between the substrate and the first insulating film, a second insulating film 42a, whose refractive index changes gradually or stepwise from the refractive index of the substrate to the refractive index of the first insulating film toward the first insulating film side from the substrate side, is formed.