发明名称 SUBSTRATE TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate treating device capable of monitoring the clogging of a filter without using an expensive pressure gauge. SOLUTION: The substrate treating device is provided with a treatment liquid tank 2 for immersing the substrate in a treatment liquid stored therein to treat the substrate, a treatment liquid circulating passage 3 for circulating the treatment liquid stored in the tank 2, a circulating pump 4 consisting of bellows pumps for circulating the treatment liquid in the passage 3, a filter 5 for filtering the treatment liquid circulating in the passage 3 by the circulating pump 4, a sensor for sensing a driving state of the circulating pump 4 based on a reciprocating time of the first and second bellows, and a control section for detecting that the pressure of the treatment liquid circulating in the passage 3 has a prescribed value or more based on the driving state of the circulating pump 4 and outputting a detection signal.
申请公布号 JP2001257190(A) 申请公布日期 2001.09.21
申请号 JP20000067915 申请日期 2000.03.13
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 MAEKAWA NAOTADA
分类号 H01L21/306;H01L21/304;(IPC1-7):H01L21/306 主分类号 H01L21/306
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