发明名称 PROCESSES AND APPARATUS FOR TREATING ELECTRONIC COMPONENTS
摘要 <p>A process for treating an electronic component (11) wherein the electronic component (11) is exposed to a heated solvent (15) and subsequently to an ozonated process fluid. The electronic component (11) is optionally exposed to the heated solvent (15) by exposing the electronic component (11) to a passing layer of heated solvent. An apparatus for treating electronic component (11) with a heated solvent (15) and ozonated fluid is also provided.</p>
申请公布号 WO2001068277(A1) 申请公布日期 2001.09.20
申请号 US2001007959 申请日期 2001.03.13
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