发明名称 |
Deposited-film formation apparatus, and deposited-film formation process |
摘要 |
The surface shape of a power-applying electrode is altered in agreement with the curving of a substrate so that the electrode-substrate distance can be kept at a constant value. This enables formation of thin films having uniform film thickness in the substrate width direction even when the electrode-substrate distance is shortened in order to make film formation rate higher in deposited-film formation apparatus of a roll-to-roll system.
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申请公布号 |
US2001022996(A1) |
申请公布日期 |
2001.09.20 |
申请号 |
US20010769328 |
申请日期 |
2001.01.26 |
申请人 |
YAJIMA TAKAHIRO;KANAI MASAHIRO;SHISHIDO TAKESHI |
发明人 |
YAJIMA TAKAHIRO;KANAI MASAHIRO;SHISHIDO TAKESHI |
分类号 |
C23C16/44;C23C16/50;C23C16/503;C23C16/54;H01J37/32;H01L21/205;H01L31/04;H01L31/18;(IPC1-7):C23C16/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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