发明名称 Deposited-film formation apparatus, and deposited-film formation process
摘要 The surface shape of a power-applying electrode is altered in agreement with the curving of a substrate so that the electrode-substrate distance can be kept at a constant value. This enables formation of thin films having uniform film thickness in the substrate width direction even when the electrode-substrate distance is shortened in order to make film formation rate higher in deposited-film formation apparatus of a roll-to-roll system.
申请公布号 US2001022996(A1) 申请公布日期 2001.09.20
申请号 US20010769328 申请日期 2001.01.26
申请人 YAJIMA TAKAHIRO;KANAI MASAHIRO;SHISHIDO TAKESHI 发明人 YAJIMA TAKAHIRO;KANAI MASAHIRO;SHISHIDO TAKESHI
分类号 C23C16/44;C23C16/50;C23C16/503;C23C16/54;H01J37/32;H01L21/205;H01L31/04;H01L31/18;(IPC1-7):C23C16/00 主分类号 C23C16/44
代理机构 代理人
主权项
地址