发明名称 COMPOSITION FOR FORMING THIN METAL OXIDE FILM
摘要 A composition from which a thin metal oxide film containing zirconium oxide as the main component can be easily formed on a surface of a substrate. The composition comprises a zirconium ingredient and one or more ingredients of a metal other than zirconium. The zirconium ingredient is a salt of an amine with a zirconium complex or zirconium salt formed from an aminopolycarboxylic acid and a zirconium compound. The ingredients of a metal other than zirconium are compounds of a metal other than zirconium. In the composition, the proportion of the zirconium ingredient is 70 to 98 mol% in terms of zirconium oxide and that of the ingredients of a metal other than zirconium is 2 to 30 mol% in terms of the oxide of the metal, based on all the metal ingredients. By using the composition, a member having a thin metal oxide film excellent in chemical stability, thermal stability, and mechanical strength is obtained.
申请公布号 WO0168529(A1) 申请公布日期 2001.09.20
申请号 WO2001JP01699 申请日期 2001.03.05
申请人 TEIKOKU CHEMICAL INDUSTRIES CO., LTD.;NAGASE & CO., LTD.;SATOH, MITSUNOBU;NISHIDE, TOSHIKAZU;OTSUKI, TETSUYA;YANAGIHARA, TAE;SAKASHITA, YOSHIAKI 发明人 SATOH, MITSUNOBU;NISHIDE, TOSHIKAZU;OTSUKI, TETSUYA;YANAGIHARA, TAE;SAKASHITA, YOSHIAKI
分类号 C01G25/02;(IPC1-7):C01G25/00 主分类号 C01G25/02
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