| 摘要 |
<p>A β-diketonatocopper(I) complex which contains an allene compound as a ligand (L) and is represented by the formula (2), wherein R6 and R7 may be the same or different and each represents linear or branched C1-4 alkyl, C1-4 alkoxy, or linear or branched C1-4 fluoroalkyl; R8 represents hydrogen or fluorine; and L represents an allene compound. It is useful in forming a thin copper film by metal-organic chemical vapor deposition (hereinafter abbreviated as MOCVD).</p> |
