| 摘要 |
<p>A laser exposure device comprises a laser oscillator (1) for oscillating a laser beam of a circular section, a beam expander (4) for expanding a laser beam from the laser oscillator, a rectangular mask (6) for shaping the expanded circular laser beam to a rectangular beam, and an optical system for reducing the rectangular laser beam. The exposure device achieves marking for improving the legibility of identification minute codes on a wafer.</p> |
