Process for galvanically treating workpieces used e.g. in the production of circuit boards comprises contacting the workpieces with a palladium colloidal solution, and recovering the solution after use

摘要

Process for galvanically treating workpieces comprises contacting the workpieces with a palladium colloidal solution; and recovering the solution after use, in which the palladium colloidal particles are removed from the solution using a membrane filter. Preferred Features: The membrane filter has a pore size of 200-10000, preferably at least 500, especially at least 2000 Daltons. The colloidal solution adhered to the surfaces of the workpieces are removed using a rinsing fluid, which is introduced under pressure through the membrane filter. Before removing the colloidal particles, the solution is mixed with a hydrochloric acid solution.