发明名称 Evaporation apparatus, particularly adapted to an evaporation plant for forming thin layers on a substrate
摘要 An evaporation apparatus, particularly for forming thin metallization layers on a substrate, comprising a vacuum chamber provided with an inlet opening or port and an outlet opening or port, wherein the vacuum chamber comprises means for transporting at least one substrate from the inlet opening to the outlet opening, at least one evaporation source being provided within the vacuum chamber; the evaporation source is movable inside the vacuum chamber, for directing a jet of vaporized material against the substrate in order to obtain a metallization layer.
申请公布号 US2001022992(A1) 申请公布日期 2001.09.20
申请号 US20010808293 申请日期 2001.03.14
申请人 REGITTNIG GERHARD 发明人 REGITTNIG GERHARD
分类号 C23C14/26;C23C14/56;(IPC1-7):C23C14/00 主分类号 C23C14/26
代理机构 代理人
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