发明名称 A method for forming a thin film
摘要 A first reactive solution is made of a water solution composed of LiOH.7H2O melted in distilled water, and a second reactive solution is made of a water solution composed of CoSO4 . 7H2O melted in distilled water. Then, the first and the second reactive solutions are put in a flow-type reactor with a pair of electrodes (1,2) and a porous base material (3) provided in between the pair of electrodes therein. The first reactive solution is flown in between one electrode and the porous base material at its given flow rate, and the second reactive solution is flown in between the other electrode and the porous base material at its given flow rate. Then, a given voltage is applied between the pair of electrodes to synthesize a compound thin film including the components of the first and the second reactive solutions directly on the porous base material a cobolt-based oxide thin film, for example.
申请公布号 EP1134822(A1) 申请公布日期 2001.09.19
申请号 EP20010106732 申请日期 2001.03.16
申请人 TOKYO INSTITUTE OF TECHNOLOGY 发明人 YOSHIMURA, MASAHIRO;FUJIWARA, TAKESHI;SONG, SEUNG-WAN;WATANABE, TOMOAKI;TERANISHI, RYO;HAN, KYOO-SEUNG
分类号 C01G51/00;C23C26/00;C25D9/04;H01M4/131;H01M4/1391;H01M4/525;H01M6/40;H01M10/05 主分类号 C01G51/00
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