| 发明名称 |
Sputtering method for forming dielectric films |
| 摘要 |
A method for forming a dielectric film having a desired composition comprising sputtering a dielectric material onto a substrate to produce an intermediary film, the intermediary film incorporating one or more elements in addition to those elements included in the desired composition of the dielectric film; and removing the one or more additional elements from the intermediary film to produce the dielectric film having the desired composition.
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| 申请公布号 |
US6290822(B1) |
申请公布日期 |
2001.09.18 |
| 申请号 |
US19990472332 |
申请日期 |
1999.12.23 |
| 申请人 |
AGERE SYSTEMS GUARDIAN CORP. |
发明人 |
FLEMING ROBERT MCIENORE;STEIGERWALD MICHAEL LOUIS;WONG YIU-HUEN;ZAHURAK SUSAN M. |
| 分类号 |
C23C14/08;C23C14/58;H01L21/28;H01L21/314;H01L21/316;H01L21/768;H01L23/522;H01L23/532;H01L29/51;(IPC1-7):C23C14/34 |
主分类号 |
C23C14/08 |
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