发明名称 SURFACE CLEANING DEVICE AND SURFACE CLEANING METHOD
摘要 PROBLEM TO BE SOLVED: To regulate the cleanliness of the surface of a work, such as a substrate, to 10-6 to 10-7 molecular layer or less by 'finely cleaning' the surface of the work to a molecular and atomic level. SOLUTION: At least one among steam of high purity and high chemical function, steam containing chemical components of a medicinal liquid and steam containing gas is supplied from a steam introducing port 31, a ejection nozzle 32 and a gas injection nozzle 33 to the surface of the substrate 11 installed within a chamber 10, by which the surface is cleaned. In succession, the surface is subjected to drying to prevent the remaining of water marks on the surface by using the steam described above.
申请公布号 JP2001252631(A) 申请公布日期 2001.09.18
申请号 JP20000067053 申请日期 2000.03.10
申请人 UCT KK 发明人 MIKI MASAHIRO;NITTA TAKEHISA;OMI TADAHIRO
分类号 B08B3/08;B08B3/10;B08B3/12;H01L21/304;(IPC1-7):B08B3/08 主分类号 B08B3/08
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