发明名称 Silica glass and its manufacturing method
摘要 A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.
申请公布号 US6291377(B1) 申请公布日期 2001.09.18
申请号 US19980150613 申请日期 1998.09.10
申请人 NIKON CORPORATION 发明人 KOMINE NORIO;FUJIWARA SEISHI;JINBO HIROKI
分类号 C03B19/14;C03B37/014;C03C3/06;C03C4/00;G03F7/20;(IPC1-7):C03C3/06 主分类号 C03B19/14
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