| 摘要 |
A photomask (1) comprises a transmissive base plate (2) a first side of which is provided with a layer of a metallic mask material (4). In this layer, a mask pattern (5) is formed which is enclosed by an inner region (6) and an outer region (7) of mask material, the inner region and the outer region being separated by a ring-shaped protection area (8). In this protection area, a protection pattern (9) is formed having tracks (10) with end portions (11) situated near the inner and outer regions and at a distance (12) therefrom, which distance is small compared to the smallest distance between pattern parts in the mask pattern (5). The photomask is thus protected against electrostatic discharges, which could damage the mask pattern.
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