发明名称 |
METHOD OF FORMING THIN FILM FOR LIGHT EMITTING DEVICES |
摘要 |
PURPOSE: A method of forming thin film for light emitting devices is provided to selectively form a film of an electro luminescence material without a waste by evaporation where the electro luminescence material is controlled by an electric field using a mask. CONSTITUTION: When a material for forming an electro luminescence layer is deposited, a mask(113) is provided between a sample boat(111) and a substrate(110). By applying voltage to the mask(113), the direction of progress of the material for forming the electro luminescence layer is controlled to be selectively deposited at a desired location. Further, the accuracy of positioning the location of film formation can be improved by using a plurality of masks. |
申请公布号 |
KR20010087326(A) |
申请公布日期 |
2001.09.15 |
申请号 |
KR20010011102 |
申请日期 |
2001.03.05 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY K.K. |
发明人 |
HIROKI MASAAKI;ISHIMARU NORIKO;YAMAZAKI SHUNPEI |
分类号 |
H05B33/10;C23C14/04;H01L27/32;H01L51/00;H01L51/30;H01L51/40 |
主分类号 |
H05B33/10 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|