发明名称 METHOD OF FORMING THIN FILM FOR LIGHT EMITTING DEVICES
摘要 PURPOSE: A method of forming thin film for light emitting devices is provided to selectively form a film of an electro luminescence material without a waste by evaporation where the electro luminescence material is controlled by an electric field using a mask. CONSTITUTION: When a material for forming an electro luminescence layer is deposited, a mask(113) is provided between a sample boat(111) and a substrate(110). By applying voltage to the mask(113), the direction of progress of the material for forming the electro luminescence layer is controlled to be selectively deposited at a desired location. Further, the accuracy of positioning the location of film formation can be improved by using a plurality of masks.
申请公布号 KR20010087326(A) 申请公布日期 2001.09.15
申请号 KR20010011102 申请日期 2001.03.05
申请人 SEMICONDUCTOR ENERGY LABORATORY K.K. 发明人 HIROKI MASAAKI;ISHIMARU NORIKO;YAMAZAKI SHUNPEI
分类号 H05B33/10;C23C14/04;H01L27/32;H01L51/00;H01L51/30;H01L51/40 主分类号 H05B33/10
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