METHOD FOR CLEANING ELECTROSTATIC CHUCK

摘要

PURPOSE: A method for cleaning an electrostatic chuck is provided to prevent pollution of an electrostatic chuck by detecting a radio frequency reflect power and compensating a parameter. CONSTITUTION: A process argon gas is supplied from an upper portion to a surface of an electrostatic chuck.(S200) A back-side gas is supplied from a bottom face to the surface of the electrostatic chuck.(S210) A radio frequency reflect power is detected on the surface of the electrostatic chuck.(S220) The detected radio frequency reflect power is compared with a reference power.(S230) A radio frequency power, the process argon gas, and the back-side gas are controlled when the detected radio frequency reflect power is more than the reference power.(S240) The surface of the electrostatic chuck is cleaned by the process argon gas(S250).