| 摘要 |
PURPOSE: To provide an electron beam irradiation device capable of avoiding effectively scattering of an electron beam, and avoiding installation of a large- scale vacuum chamber. CONSTITUTION: This device is equipped with a support part 4 for supporting an electron beam irradiation object 3 to which the electron beam 2 is irradiated, and an electron beam irradiation head 6 facing to the electron beam irradiation object at minute intervals and having an electron beam outgoing hole 5 for irradiating the electron beam 2 to the electron beam irradiation object 3. The device has a constitution in which an electron beam passage 20 communicating with the electron beam outgoing hole 5 is installed in the electron beam irradiation head 6, and one or more ring-shaped gas absorbing grooves 61, 62 opened to the opposite face to the electron beam irradiation object are formed on the periphery of the centered electron beam outgoing hole 5, and a vacuum pump is connected to the electron beam passage 20 and the ring-shaped gas absorbing grooves 61, 62 to keep the electron beam passage at high vacuum.
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