| 摘要 |
PURPOSE: A semiconductor exposure system and an exposure method using the same are provided to reduce a manufacturing cost of a mask by using a shielding mask together with a filtering mask. CONSTITUTION: A fly eye lens(21) flattens the light emitted from a light source. A condenser lens(23) is located parallel to the fly eye lens(21). The condenser lens(23) condenses the light. A projection lens(25) concentrates the condensed light on a wafer(16). A reticle portion(24) is located between the condenser lens(23) and the projection lens(25). The shielding mask(14) intercepts the condensed light. The reticle portion(24) has a shielding mask for shielding the condensed light and a frequency filtering mask. A lighting filter portion(22) is installed between the fly eye lens(23) and the projection lens(25).
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