CROSSLINKABLE HIGH RESOLUTION PHOTORESIST COMPOSITION USABLE TOGETHER WITH DEVELOPING SOLUTION WHICH IS AQUEOUS SOLUTION HAVING HIGH BASE CONCENTRATION AND PHOTORESIST PATTERN FORMING METHOD USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a high resolution photoresist composition used under deep UV and usable together with an aqueous developing solution having high basicity. SOLUTION: The photoresist composition contains a methacrylate polymer resin having a phenol group, a crosslinker selected from glycoluril derivatives each capable of reacting with the resin in the presence of an acid catalyst, a photo-acid initiator and an organic solvent. The composition is particularly useful in the formation of a negative type image having a high resolution of <0.125 μm.