发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD, CIRCUIT BOARD, AND ELECTRONIC EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor device and its manufacturing method, a circuit board, and electronic equipment that can cope with the electric connection with a narrow pitch. SOLUTION: The manufacturing method of a semiconductor device includes a process where a substrate 20 where a through hole 24 that is positioned on an electrode 12 is formed and at the same time wiring 22 is formed on a surface at the opposite side of the electrode 12 is arranged on a surface where the electrode 12 of a semiconductor chip 10 is formed, the through hole 24 is filled with a conductive material 30, and the electrode 12 is electrically connected to the wiring 22.</p>
申请公布号 JP2001250842(A) 申请公布日期 2001.09.14
申请号 JP20000061416 申请日期 2000.03.07
申请人 SEIKO EPSON CORP 发明人 SAITO HIDETAKA
分类号 H01L23/12;H01L21/60;(IPC1-7):H01L21/60 主分类号 H01L23/12
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