发明名称 |
COMPOSITION FOR REMOVING ALUMINUM SMUT |
摘要 |
PROBLEM TO BE SOLVED: To provide an improved composition and method for pretreating aluminum prior to electroplating. SOLUTION: An aqueous composition consisting of an acid, an oxidizing agent and a halide compound as an optional component is provided by this invention. This composition is useful in a method for efficiently removing the smut generated in the etching stage of an aluminum pretreating process. As an alternate method, such a composition is used in a combined method of etching and smut removal in Al pretreatment.
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申请公布号 |
JP2001247986(A) |
申请公布日期 |
2001.09.14 |
申请号 |
JP20010040150 |
申请日期 |
2001.02.16 |
申请人 |
ATOTECH DEUTSCHE GMBH |
发明人 |
META MAULIK D;BUTKOVSKY PAUL A |
分类号 |
C23F1/20;C23G1/12;C25D5/44;C25D11/16;(IPC1-7):C23G1/12 |
主分类号 |
C23F1/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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