发明名称 COMPOSITION FOR REMOVING ALUMINUM SMUT
摘要 PROBLEM TO BE SOLVED: To provide an improved composition and method for pretreating aluminum prior to electroplating. SOLUTION: An aqueous composition consisting of an acid, an oxidizing agent and a halide compound as an optional component is provided by this invention. This composition is useful in a method for efficiently removing the smut generated in the etching stage of an aluminum pretreating process. As an alternate method, such a composition is used in a combined method of etching and smut removal in Al pretreatment.
申请公布号 JP2001247986(A) 申请公布日期 2001.09.14
申请号 JP20010040150 申请日期 2001.02.16
申请人 ATOTECH DEUTSCHE GMBH 发明人 META MAULIK D;BUTKOVSKY PAUL A
分类号 C23F1/20;C23G1/12;C25D5/44;C25D11/16;(IPC1-7):C23G1/12 主分类号 C23F1/20
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