| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus which can prevent any abnormal discharge. SOLUTION: The vacuum treatment apparatus 30 comprises an anti-deposition container 32 of a double structure in a vacuum tank 31. When outer containers 101, 111 and inner containers 102, 112 are disposed close to each other in an insulated condition from each other, no discharge is achieved therebetween. In the case of achieving the vacuum treatment with a substrate 17 disposed in the anti-deposition container 31, no discharge is generated outside the anti- deposition chamber 31, and the vacuum treatment becomes consistent.
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