| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for depositing a film in which a film can be deposited flatly while facilitating filling of trenches and holes. SOLUTION: A container 53a has double structure of an insulating material containing tank 95 for containing molten metal ML of film material, and a conductive outer tank 96 for containing the material containing tank 95 tightly. Since the molten metal ML contained in the insulating material containing tank 95 is isolated electrically from the electrode of a hearth 51 for introducing a plasma beam PB, direct impingement of the plasma beam PB on the molten metal ML can be avoided. Since the molten metal ML is heated indirectly from the container 53a, stabilized uniform heating is ensured while suppressing generation of splash and droplets, and impurities can be prevented from being mixed at the time of film deposition.
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