| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical amplification type positive type photoresist composition having high sensitivity, high resolving power, improved development defects and surface roughness. SOLUTION: The positive type photoresist composition contains (a) a resin having an acid decomposable group with a specified structure and having solubility in an alkali developing solution increased by decomposition by the action of an acid and (b) a compound which generates the acid when irradiated with active light or radiation. |
