| 摘要 |
PROBLEM TO BE SOLVED: To perform normal exposure by controlling an original disk to a low temperature so as to suppress chemical reaction between PED in a device and a method for exposing the original disk, designed to expose photosensitizer by radiating a laser beam to the potosensitizer disposed on the original disk. SOLUTION: Temperature-controlled gas is purged from the surface of an original disk before exposure, and the exposure is started after the drop of the original disk surface temperature to a specified temperature is confirmed. Before the original disk is taken out from the device after the exposure, the surface temperature of the original disk is increased to another temperature, e.g. the temperature of Post Exposure Bake(PEB), and the original disk is taken out from the device after its holding for a certain period.
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