发明名称 POWER SEMICONDUCTOR ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an IGBT having a high load short-circuit resistance with a low ON-voltage maintained. SOLUTION: The semiconductor element comprises an n-base layer 1, p-base layers 7, 11 selectively formed on one surface of the n-base layer 1, n-emitter layer 8 formed selectively on the p-base layer surface, gate electrode 6 provided through a gate insulation film 5 on the p-base layer between the n-emitter layer and the n-base layer, collector layer 3 formed on the other surface of the n-base layer, collector electrode 9 provided on the collector layer, and emitter electrode 10 provided on both the n-emitter layer and the p-base layer. A p-type impurity concentration distribution in channel regions of the p-base layers 7, 11 has peak concentrations at positions nearer to the n-base layer than the junction between the n-emitter layer and the p-base layer.
申请公布号 JP2001250947(A) 申请公布日期 2001.09.14
申请号 JP20000060480 申请日期 2000.03.06
申请人 TOSHIBA CORP 发明人 HATTORI HIDETAKA;YAMAGUCHI SHOICHI
分类号 H01L29/749;H01L21/331;H01L29/06;H01L29/10;H01L29/739;H01L29/745;H01L29/78;(IPC1-7):H01L29/78 主分类号 H01L29/749
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