| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processing device capable of making a plasma distribution high in uniformity. SOLUTION: A plasma processing device carries out processing through a manner in which processing gas G is introduced into a discharge tube 6 formed of dielectric material, and the processing gas G is irradiated with microwaves radiated through slits provided to a microwave waveguide 10 to produce a plasma. Active seeds contained in the plasma are fed onto the surface of a work as an object of processing to carry out processing, where the microwave waveguide 10 is so structured that the mode of microwaves propagating through its inside becomes a multiple mode. |
