| 摘要 |
A compound of formula (I) is new. - In (I), R1 = 1-20C alkyl, 3-12C cycloalkyl, 2-8C alkenyl, phenyl-1-6C alkyl or naphthyl-1-3C alkyl optionally interrupted by O, S(O)p and/or NR5 or optionally substituted by 1-12C alkyl, OR6, R7S(O)p, R7S(O)2O, NR8R9, SiR10R11R12, BR13R14 or R15R16P(O)q; R2, R3 and R4 = phenyl or biphenyl optionally substituted with 1-12C alkyl (optionally substituted with OR6, NR8R9 or halogen), OR6, R7S(O)p, R7S(O)2O, R8R9NS(O)2, NR8R9, NR8R9CO, SiR10R11R12, BR13R14, halogen, R15R16P(O)q or a group of formulae (Ia)-(If), where the sum of the Hammett sigma -constants ( sigma ) or R2, R3 and R4 is between +0.36 and +2.58; X = O, S or NR21; R5 = H, 1-12C alkyl, phenyl-1-6C alkyl (optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen) or phenyl (optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen); R6 and R7 = 1-12C alkyl (optionally substituted with halogen), phenyl-1-6C alkyl (optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen) or phenyl (optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen); R8-R16 = 1-12C alkyl, 3-12C cycloalkyl, phenyl-1-6C alkyl (optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen) or phenyl (optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen) or R8 and R9, together with the N to which they are attached, form a 6-membered aliphatic ring optionally containing O or S heteroatom; R17-R20 = H, 1-12C alkyl (optionally substituted with 1-12C alkoxy), phenyl or phenyl-1-6C alkyl (either of which is optionally substituted 1-5 times by 1-6C alkyl, 1-12C alkoxy or halogen); p = 0-2; r = 0-5; R21 = H or 1-12C alkyl; R22, R22a, R23 and R24 = H, 1-12C alkyl( optionally substituted by 1-12C alkoxy, OH or halogen) or phenyl (optionally substituted by 1-12C alkoxy, OH or halogen); q = 0 or 1; and G = a radical which is able to form positive ions. - Also claimed are: (i) a composition comprising: (a) ethylenically unsaturated compound(s); (b) compound(s) containing an acidic group, which may also be present in (a); (c) photoinitiator(s) of formula (I); and optionally (d) coinitiator(s); (ii) a process for the photopolymerisation of non-volatile monomeric, oligomeric or polymeric compounds containing ethylenically unsaturated double bond(s) and compound(s) containing an acidic group; (iii) a substrate which is coated on its surface(s) with a composition as in (i); (iv) a process for the photographic production of relief images which comprises subjecting a coated substrate as in (iii) to imagewise exposure and removing the unexposed areas with a solvent; (v) a process for producing relief images which comprises exposing a coated substrate as in (iii) by means of a movable laser beam (without mask) and subsequently removing the unexposed areas with a solvent; and (vi) a process for the thermal polymerisation of compounds containing ethylenically unsaturated double bonds, which comprises using (I) as an initiator.
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