| 摘要 |
PROBLEM TO BE SOLVED: To provide an alkali developable positive type photosensitive resin precursor composition excellent in solvent resistance. SOLUTION: The polybenzoxazole precursor composition is based on a structural unit of formula 1 (where R1 is one of groups of formulae 2-5; R2 is a tri- to hexavalent >=2C organic group; (n) is an integer of 10-100,000; (p) is an integer of 1-4; R3 and R4 are each H, a 1-10C organic group, nitro, halogen or perfluoroalkyl and may be the same or different; and (x) and (y) are each an integer of 1-4) and the positive type photosensitive resin precursor composition contains the polybenzoxazole precursor composition and an o-quinonediazido compound. |
