| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate drying device which is capable of drying a substrate without generating water marks on its surface and restraining a drying cost from increasing even if the substrate has a fine and complicated structure. SOLUTION: Drying gas of fluorine inert fluid generated by a drying gas generator 31 is heated by a heater 37 and then fed through a drying gas feed nozzle 30. The drying gas is supplied as a flow of gas onto the main surface of a substrate W while it is pulled up from a pure water in a cleaning tank 20. A fluorine inert fluid is condensed on the surface of the substrate W, substituted for water, and evaporated. The fluorine inert fluid is excellent in permeability and drying characteristics, so that it is capable of restraining water marks from being formed on the surface of the substrate even if the substrate has a fine and complicated structure, and it restrains a drying process from increasing in cost because it has no adverse effect on an environment and requires no special treatment when it is disused.
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