Polymer compound, method of producing the same, photosensitive composition, and pattern formation method

摘要

The present invention provides a cross-linkable polymer compound which can be developed with an aqueous developer and exhibits excellent patterning properties; a photosensitive composition containing the same; and a pattern formation method employing the composition. The polymer compound containing monomer units represented by formulas (I) to (III): wherein each of R1 to R4 is hydrogen and/or a methyl group; p represents an integer between 1 to 10 inclusive; X represents hydrogen, an alkali metal, or an ammonium represented by formula (1): wherein each of R5 to R8 represents hydrogen, a C1-C3 alkyl group, or a C1-C3 alkanol group; and a plurality of Xs may be the same or different from one another, the compositional proportions of the monomer units falling within the following ranges: 2 mol %<=1<=73 mol %; 8 mol %<=m<=83 mol %; and 15 mol %<=n<=80 mol %.