发明名称 CVD method
摘要 There is provided a CVD method capable of inexpensively and effectively preventing films from being peeled off from the inner wall of a chamber and/or members in the chamber. By supplying a passivating gas into a chamber 11 while no object to be processed exists in the chamber 11, a passivation film is formed the inner wall of the chamber 11 and/or the surface of a member 20 in the chamber 11. Subsequently, by supplying a pre-coating gas into the chamber 11 while no object to be processed exists in the chamber, a pre-coat film is formed on the surface of the passivation film. Thereafter, an object W to be processed is introduced into the chamber 11, and a depositing gas is supplied into the chamber 11 to carry out a deposition process on the object W.
申请公布号 US2001021414(A1) 申请公布日期 2001.09.13
申请号 US20010799531 申请日期 2001.03.07
申请人 MORISHIMA MASATO;OSHIMA YASUHIRO 发明人 MORISHIMA MASATO;OSHIMA YASUHIRO
分类号 C23C16/44;H01L21/205;H01L21/285;(IPC1-7):C23C16/00 主分类号 C23C16/44
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