| 摘要 |
An end face polishing apparatus is provided in which polishing accuracy is improved, regardless of the length of the ferrule when polishing the end face of the ferrule. The end face polishing apparatus in which a rod-shaped member mounted on a jig plate by a polishing member mounted on the polishing plate which is rotatably and swingably supported to the apparatus body is pressed to be polished; in which the jig plate is provided on either the jig plate or the polishing plate, and the other is slidably contacted by a slidable contact member, and is supported in a state where rotation is regulated on the polishing plate.
|
