发明名称 METHODS OF ENHANCING DATA RETENTION OF A FLOATING GATE TRANSISTOR, METHODS OF FORMING FLOATING GATE TRANSISTORS, AND FLOATING GATE TRANSISTORS
摘要 Floating gate transistors and methods of forming the same are described. In one implementation, a floating gate is formed over a substrate. The floating gate has an inner first portion and an outer second portion. Conductivity enhancing impurity is provided in the inner first portion to a greater concentration than conductivity enhancing impurity in the outer second portion. In another implementation, the floating gate is formed from a first layer of conductively doped semiconductive material and a second layer of substantially undoped semiconductive material. In another implementation, the floating gate is formed from a first material having a first average grain size and a second material having a second average grain size which is larger than the first average grain size.
申请公布号 US2001021549(A1) 申请公布日期 2001.09.13
申请号 US19980118359 申请日期 1998.07.17
申请人 KELLER J. DENNIS;LEE ROGER R. 发明人 KELLER J. DENNIS;LEE ROGER R.
分类号 H01L21/8247;H01L27/115;H01L29/49;(IPC1-7):H01L21/336;H01L21/823;H01L21/28;H01L21/44;H01L21/320;H01L21/476 主分类号 H01L21/8247
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