发明名称 |
Method to detect and classify scratch on semiconductor wafer; involves forming list of faulty cells in co-ordinate system to obtain standard deviation, which is compared with number of faulty cells |
摘要 |
The method involves defining a co-ordinate system for a wafer (1). A list of dropped or faulty cells (4) in the co-ordinate system is created, corresponding to the cell errors on the wafer, and is used with a total number of dropped cells on the wafer, to obtain a standard deviation of faulty cells for a number of different angles. A ratio of standard deviations is compared with the number of faulty cells, to determine the presence of a scratch.
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申请公布号 |
DE10101203(A1) |
申请公布日期 |
2001.09.13 |
申请号 |
DE20011001203 |
申请日期 |
2001.01.11 |
申请人 |
INFINEON TECHNOLOGIES NORTH AMERICA CORP., SAN JOSE |
发明人 |
HLADSCHIK, THOMAS |
分类号 |
H01L21/66;(IPC1-7):H01L21/66;G01N21/898 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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地址 |
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